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- MB Series RF13.56 / 27.12 Mhz Automatic Matching Network
MB Series RF13.56 / 27.12 Mhz Automatic Matching Network
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Terms and Conditions
Lead time 4-6 weeks
Key Technical Parameters
Key Technical Parameters
The MB13/27XXX series automatic matchers are installed between an RF power supply and a plasma load. They automatically tune the load impedance to match the output impedance of the RF generator, maximising power transfer to the load and minimising the reflected signal.
The matcher uses high-precision V/I sensing, a high-speed FPGA controller and proprietary impedance-tracking algorithms to deliver fast and accurate measurement and matching of the load impedance. With its high matching accuracy, wide tuning range and high matching speed, the unit is suitable for a wide variety of RF power systems.
- Fully digital control with high matching accuracy and short matching time.
- Compact, small-footprint enclosure that is easy to install.
- Manual and automatic matching modes.
- Parameter save / preset memory function.
- Communications interface ― can be connected directly to a host computer to display the real-time load status.
- Built with vacuum capacitors for high reliability and a long service life.
- Wide tuning range; can be customised to the specific load requirements.
| Parameter | MB13015 / MB27015 | MB13030 / MB27030 | MB13060 / MB27060 |
|---|---|---|---|
| Operating frequency | 13.56 MHz / 27.12 MHz * | ||
| Input connector | N-type | L29 | L29 |
| Output connector | Copper bus-bar or L29 | Copper busbar or custom interface | |
| Transmission power | 1.5 kW ** | 3 kW ** | 6 kW ** |
| Maximum voltage | 3000 V peak | 4500 V peak | 6000 V peak |
| Maximum current | 30 A rms | 45 A rms | 60 A rms |
| Reflected power | ≤ 3 W or 1 % of the input power | ||
| Matching time | ≤ 2 s (preset point: ≤ 0.5 s) | ||
| Target impedance | 50 Ω | ||
| Dimensions (L × W × H, mm) | 400 × 260 × 132 | 400 × 350 × 155 | 450 × 400 × 177 |
| Cooling method | Air-cooled | Air + water-cooled (water flow ≥ 2 L/min) | Air + water-cooled (water flow 4 L/min) |
| Remote interface | RS485 / RJ45 Ethernet | ||
| AC supply voltage | Single-phase 220 V ±10 % AC, 50 / 60 Hz | ||
| Operating temperature | +5 °C to +40 °C | ||
* has to be selected with order. Example: MB13xxx – 13,56 Mhz, MB27xxx – 27,12 Mhz
** has to be selected with order. Example: MBxx015 – 1,5kW, MBxx030 – 3kW
Download detailed technical documentation and product specifications. Access to documentation is available after submitting your email address.
Download product specification
Enter your email to receive the technical datasheet.
By submitting this form, you agree to our Privacy Policy.
The MB13/27XXX series automatic matchers are installed between an RF power supply and a plasma load. They automatically tune the load impedance to match the output impedance of the RF generator, maximising power transfer to the load and minimising the reflected signal.
The matcher uses high-precision V/I sensing, a high-speed FPGA controller and proprietary impedance-tracking algorithms to deliver fast and accurate measurement and matching of the load impedance. With its high matching accuracy, wide tuning range and high matching speed, the unit is suitable for a wide variety of RF power systems.
- Fully digital control with high matching accuracy and short matching time.
- Compact, small-footprint enclosure that is easy to install.
- Manual and automatic matching modes.
- Parameter save / preset memory function.
- Communications interface ― can be connected directly to a host computer to display the real-time load status.
- Built with vacuum capacitors for high reliability and a long service life.
- Wide tuning range; can be customised to the specific load requirements.
| Parameter | MB13015 / MB27015 | MB13030 / MB27030 | MB13060 / MB27060 |
|---|---|---|---|
| Operating frequency | 13.56 MHz / 27.12 MHz * | ||
| Input connector | N-type | L29 | L29 |
| Output connector | Copper bus-bar or L29 | Copper busbar or custom interface | |
| Transmission power | 1.5 kW ** | 3 kW ** | 6 kW ** |
| Maximum voltage | 3000 V peak | 4500 V peak | 6000 V peak |
| Maximum current | 30 A rms | 45 A rms | 60 A rms |
| Reflected power | ≤ 3 W or 1 % of the input power | ||
| Matching time | ≤ 2 s (preset point: ≤ 0.5 s) | ||
| Target impedance | 50 Ω | ||
| Dimensions (L × W × H, mm) | 400 × 260 × 132 | 400 × 350 × 155 | 450 × 400 × 177 |
| Cooling method | Air-cooled | Air + water-cooled (water flow ≥ 2 L/min) | Air + water-cooled (water flow 4 L/min) |
| Remote interface | RS485 / RJ45 Ethernet | ||
| AC supply voltage | Single-phase 220 V ±10 % AC, 50 / 60 Hz | ||
| Operating temperature | +5 °C to +40 °C | ||
* has to be selected with order. Example: MB13xxx – 13,56 Mhz, MB27xxx – 27,12 Mhz
** has to be selected with order. Example: MBxx015 – 1,5kW, MBxx030 – 3kW
Download detailed technical documentation and product specifications. Access to documentation is available after submitting your email address.
Download product specification
Enter your email to receive the technical datasheet.
By submitting this form, you agree to our Privacy Policy.
Compatible Systems and Components
Industries Using This Technology
EDF systems support research, development and industrial processes in advanced materials and thin film technologies.
Semiconductor research
Thin film deposition and sputtering processes used in semiconductor laboratories.
Materials science
Controlled deposition processes for advanced materials research.
Vacuum coating industry
Stable RF power supply for industrial vacuum coating systems.
Optical coatings
Precise process control for optical thin film applications.
University laboratories
Reliable systems for academic research and experimental setups.
R&D and process development
Flexible power control for testing and developing new coating processes.
Research labs • Universities • Industrial coating facilities
Technical Consultation
Not sure which configuration fits your system? Our engineers will help you select the right solution for your application.
Compatible Systems and Components
Industries Using This Technology
EDF systems support research, development and industrial processes in advanced materials and thin film technologies.
Semiconductor research
Thin film deposition and sputtering processes used in semiconductor laboratories.
Materials science
Controlled deposition processes for advanced materials research.
Vacuum coating industry
Stable RF power supply for industrial vacuum coating systems.
Optical coatings
Precise process control for optical thin film applications.
University laboratories
Reliable systems for academic research and experimental setups.
R&D and process development
Flexible power control for testing and developing new coating processes.
Research labs • Universities • Industrial coating facilities
Technical Consultation
Not sure which configuration fits your system? Our engineers will help you select the right solution for your application.
What you need
Tell us about your application. We will help you select the right solution.
What you need
Tell us about your application. We will help you select the right solution.