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- PPS 1500U - DC and PulseDC plasma power supply
PPS 1500U - DC and PulseDC plasma power supply
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Terms and Conditions
Lead time 4-6 weeks
Key Technical Parameters
Key Technical Parameters
PPS 1500U - DC and PulseDC plasma power supply
The PPS 1500U is a versatile dual source power supply combining DC and PulseDC operating modes available for R&D coating & cleaning applications. Unit is available with two frequency ranges: 120kHz or 300kHz. It can control up to two sources which may be any combination of compact magnetron sputter heads or glow discharge heads. Sputter sources can even be positioned in separate chambers.
The PPS 1500U is only 2U height and also features a vacuum gauge interlock. It can be used as a standalone table-top device or rack mounted.
Remote control is possible via Analog, Serial or LAN/Ethernet interface and a remote mobile application is currently under development. This unique feature allows the user to observe the plasma whilst adjusting the source parameters with a handheld mobile device.
Low-Ripple Noise Technology, the elimination of high-voltage transistor switching using resonant converter technology and current-diversion circuits, results in superior reliability as well as excellent process performance in the form of high output voltage consistency.
Arc Detection and Suppression are guaranteed by fast response loop in less than 2 us.
- Coating for moulds and tools
- Semiconductor wafer sputtering
- Oxide TFT LCD & Colour filter
- TFT LCD
- OLED LTPS sputter metal & TCO deposition
- Thin film for solar cells
- ITO deposition for touch panels
- BIPV, data storage, FCCL
- Automotive wheels and head lamps
- Ion nitriding
- Mobile phone cases
Extremely stable output allows for operating the sources even at powers less than 2W, which makes this device unique in its own class and in comparison to competitor offerings. It is ideal for R&D applications!
Fast Ramp Response guarantees fast arc detection - negates the need for arc suppression!
- DC or PulseDC operating mode in one unit
- Two HV outputs for dual magnetron operation – selectable operation; no external switch box needed
- Suppression & arc detection
- Selectable voltage
- Current & power regulation mode
- Clear output power LED indicator
- Timer mode operation
- Stable operation from 2W only
- Large impedance range – different size magnetron operation
- Ideal for 2“, 3“ and higher magnetron operation
- User friendly interface with LCD display with keyboard and rotary encoder operation. Easy to install with compact design and high-power density
- Self-diagnosis functions (protection, limit)
- Overtemperature protection
- Short-circuit and overvoltage protection
| Electrical | |
|---|---|
| Input Voltage | 195 to 250 Vac (43 .... 63 Hz), 1 phase operation * |
| Input current | Max 8A; Power factor = min 0.90 |
| Mode of operation | DC and Unipolar PulseDC |
| Frequency in PulseDC operation | 10 kHz ... 120 kHz or 10 kHz ... 300 kHz ** |
| Duty Cycle in PulseDC operation | 2...99% ( 2us min) |
| Output Power | 1500W max in DC and PulseDC mode |
| Output Voltage/Current/Power | 0 – 1000 VDC negative (ignition voltage 1200V) 0 – 3000 mA (1 mA step) |
| Regulation type | Power, Current and Voltage |
| Ripple noise | Switching: 2% p-p (50kHz) Line: 1% p-p (100/120 Hz) |
| Ramp timer | Programmable |
| Communication Interface | Analogue, Serial (RS232 or RS485**) and Ethernet 10/100Mb |
| Methods of control | Local or remote through Communication Interface |
| Arc Detection | < 2 us Response Time |
| Dimensions | 483 x 395 x 88 mm (W x D x H) - 2U Rack Mounting Standard |
| Weight | 10.8 kg |
| * alternatively, operation is also possible from two hot wires 3 phase systems, providing the voltage between them which does not exceed more than 250 VAC; 110VAC operation is possible as well, but with limited output power ( 1000 W ) | |
| I/O Control | |
| Analog Interface | 25 Dsub male connector isolated (up to 2000 V RMS, 0...5V Analogue, 0/24 VDC Digital) |
| Serial Communication Options | RS232 or RS485 with ModBUS EDF’s protocol **; Ethernet IP, with ModBUS TSP EDF’s protocol |
| ** configurable with order only | |
Download detailed technical documentation and product specifications. Access to documentation is available after submitting your email address.
Download product specification
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PPS 1500U - DC and PulseDC plasma power supply
The PPS 1500U is a versatile dual source power supply combining DC and PulseDC operating modes available for R&D coating & cleaning applications. Unit is available with two frequency ranges: 120kHz or 300kHz. It can control up to two sources which may be any combination of compact magnetron sputter heads or glow discharge heads. Sputter sources can even be positioned in separate chambers.
The PPS 1500U is only 2U height and also features a vacuum gauge interlock. It can be used as a standalone table-top device or rack mounted.
Remote control is possible via Analog, Serial or LAN/Ethernet interface and a remote mobile application is currently under development. This unique feature allows the user to observe the plasma whilst adjusting the source parameters with a handheld mobile device.
Low-Ripple Noise Technology, the elimination of high-voltage transistor switching using resonant converter technology and current-diversion circuits, results in superior reliability as well as excellent process performance in the form of high output voltage consistency.
Arc Detection and Suppression are guaranteed by fast response loop in less than 2 us.
- Coating for moulds and tools
- Semiconductor wafer sputtering
- Oxide TFT LCD & Colour filter
- TFT LCD
- OLED LTPS sputter metal & TCO deposition
- Thin film for solar cells
- ITO deposition for touch panels
- BIPV, data storage, FCCL
- Automotive wheels and head lamps
- Ion nitriding
- Mobile phone cases
Extremely stable output allows for operating the sources even at powers less than 2W, which makes this device unique in its own class and in comparison to competitor offerings. It is ideal for R&D applications!
Fast Ramp Response guarantees fast arc detection - negates the need for arc suppression!
- DC or PulseDC operating mode in one unit
- Two HV outputs for dual magnetron operation – selectable operation; no external switch box needed
- Suppression & arc detection
- Selectable voltage
- Current & power regulation mode
- Clear output power LED indicator
- Timer mode operation
- Stable operation from 2W only
- Large impedance range – different size magnetron operation
- Ideal for 2“, 3“ and higher magnetron operation
- User friendly interface with LCD display with keyboard and rotary encoder operation. Easy to install with compact design and high-power density
- Self-diagnosis functions (protection, limit)
- Overtemperature protection
- Short-circuit and overvoltage protection
| Electrical | |
|---|---|
| Input Voltage | 195 to 250 Vac (43 .... 63 Hz), 1 phase operation * |
| Input current | Max 8A; Power factor = min 0.90 |
| Mode of operation | DC and Unipolar PulseDC |
| Frequency in PulseDC operation | 10 kHz ... 120 kHz or 10 kHz ... 300 kHz ** |
| Duty Cycle in PulseDC operation | 2...99% ( 2us min) |
| Output Power | 1500W max in DC and PulseDC mode |
| Output Voltage/Current/Power | 0 – 1000 VDC negative (ignition voltage 1200V) 0 – 3000 mA (1 mA step) |
| Regulation type | Power, Current and Voltage |
| Ripple noise | Switching: 2% p-p (50kHz) Line: 1% p-p (100/120 Hz) |
| Ramp timer | Programmable |
| Communication Interface | Analogue, Serial (RS232 or RS485**) and Ethernet 10/100Mb |
| Methods of control | Local or remote through Communication Interface |
| Arc Detection | < 2 us Response Time |
| Dimensions | 483 x 395 x 88 mm (W x D x H) - 2U Rack Mounting Standard |
| Weight | 10.8 kg |
| * alternatively, operation is also possible from two hot wires 3 phase systems, providing the voltage between them which does not exceed more than 250 VAC; 110VAC operation is possible as well, but with limited output power ( 1000 W ) | |
| I/O Control | |
| Analog Interface | 25 Dsub male connector isolated (up to 2000 V RMS, 0...5V Analogue, 0/24 VDC Digital) |
| Serial Communication Options | RS232 or RS485 with ModBUS EDF’s protocol **; Ethernet IP, with ModBUS TSP EDF’s protocol |
| ** configurable with order only | |
Download detailed technical documentation and product specifications. Access to documentation is available after submitting your email address.
Download product specification
Enter your email to receive the technical datasheet.
By submitting this form, you agree to our Privacy Policy.
Compatible Systems and Components
Industries Using This Technology
EDF systems support research, development and industrial processes in advanced materials and thin film technologies.
Semiconductor research
Thin film deposition and sputtering processes used in semiconductor laboratories.
Materials science
Controlled deposition processes for advanced materials research.
Vacuum coating industry
Stable RF power supply for industrial vacuum coating systems.
Optical coatings
Precise process control for optical thin film applications.
University laboratories
Reliable systems for academic research and experimental setups.
R&D and process development
Flexible power control for testing and developing new coating processes.
Research labs • Universities • Industrial coating facilities
Technical Consultation
Not sure which configuration fits your system? Our engineers will help you select the right solution for your application.
Compatible Systems and Components
Industries Using This Technology
EDF systems support research, development and industrial processes in advanced materials and thin film technologies.
Semiconductor research
Thin film deposition and sputtering processes used in semiconductor laboratories.
Materials science
Controlled deposition processes for advanced materials research.
Vacuum coating industry
Stable RF power supply for industrial vacuum coating systems.
Optical coatings
Precise process control for optical thin film applications.
University laboratories
Reliable systems for academic research and experimental setups.
R&D and process development
Flexible power control for testing and developing new coating processes.
Research labs • Universities • Industrial coating facilities
Technical Consultation
Not sure which configuration fits your system? Our engineers will help you select the right solution for your application.
What you need
Tell us about your application. We will help you select the right solution.
What you need
Tell us about your application. We will help you select the right solution.

