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- PPS R Series RF13.56 / 27.12 Mhz RF Generator
PPS R Series RF13.56 / 27.12 Mhz RF Generator
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Terms and Conditions
Lead time 4-6 weeks
Key Technical Parameters
Key Technical Parameters
The PPSxxxR series are RF power generators designed for demanding semiconductor processes, including RF sputtering, PECVD (plasma-enhanced chemical vapor deposition), and reactive ion etching. The compact 2U rack-mount form factor ensures straightforward installation in standard equipment cabinets.
Built around a stable, high-precision signal source and an advanced power amplifier control module, the PPSxxxR series enables accurate measurement of both incident and reflected power, with precise closed-loop output power control. These generators are ideally suited for a wide range of vacuum plasma and thin film deposition applications.
- Advanced, high-efficiency, and high-stability RF power amplifier technology
- Stable and reliable power amplifier and DC control module
- Large output power margin, capable of long-term stable operation
- Standing wave protection with quick recovery after abnormal load conditions
- Accurate power measurement capabilities, including output and reflected power
- Automatic gain control for precise output power regulation
- Local and remote control capabilities
- Modular design: space-saving, easy to install and maintain
- Real-time power and load impedance measurement
| Parameter | PPS600R-13 / PPS600R-27 | PPS1000R-13 / PPS1000R-27 | PPS1500R-13 / PPS1500R-27 |
|---|---|---|---|
| Input Voltage | Single phase 220V ±10% AC 50/60Hz | ||
| Output Frequency | 13.56 MHz / 27.12 MHz | ||
| Frequency Stability | ±0.005% | ||
| Rated Output Power | 600 W | 1 kW | 1.5 kW |
| Power Adjustment Range | 10 W – 600 W | 15 W – 1 kW | 20 W – 1.5 kW |
| Max. Reflected Power | 120 W | 200 W | 300 W |
| RF Output Connector | N-type female or custom | ||
| I/O Port | DB25 female connector | ||
| Communication Interface | RS485 serial, RJ45 Ethernet, standard DB9 female (for matching network) | ||
| Power Stability | 1% of set power, or 0.1% of max. power (whichever is greater) | ||
| Output Mode | Continuous, Pulsed (optional) | ||
| Pulse Frequency | 100 Hz – 30 kHz | ||
| Duty Cycle | 1–99% (min. on/off time: 12 µs) | ||
| Harmonics | < –50 dBc | ||
| Spurious Emissions | < –50 dBc | ||
| Overall Efficiency | ≥ 70% (Z = 50 Ω, rated output) | ||
| Phase Sync Function | Supported | ||
| Protection Functions | Overvoltage, overcurrent, overtemperature; reflected power limit; external interlock; arc suppression | ||
| Cooling Method | Forced air (fan cooling) | ||
| Dimensions (D×W×H mm) | 450 × 483 × 88 | ||
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The PPSxxxR series are RF power generators designed for demanding semiconductor processes, including RF sputtering, PECVD (plasma-enhanced chemical vapor deposition), and reactive ion etching. The compact 2U rack-mount form factor ensures straightforward installation in standard equipment cabinets.
Built around a stable, high-precision signal source and an advanced power amplifier control module, the PPSxxxR series enables accurate measurement of both incident and reflected power, with precise closed-loop output power control. These generators are ideally suited for a wide range of vacuum plasma and thin film deposition applications.
- Advanced, high-efficiency, and high-stability RF power amplifier technology
- Stable and reliable power amplifier and DC control module
- Large output power margin, capable of long-term stable operation
- Standing wave protection with quick recovery after abnormal load conditions
- Accurate power measurement capabilities, including output and reflected power
- Automatic gain control for precise output power regulation
- Local and remote control capabilities
- Modular design: space-saving, easy to install and maintain
- Real-time power and load impedance measurement
| Parameter | PPS600R-13 / PPS600R-27 | PPS1000R-13 / PPS1000R-27 | PPS1500R-13 / PPS1500R-27 |
|---|---|---|---|
| Input Voltage | Single phase 220V ±10% AC 50/60Hz | ||
| Output Frequency | 13.56 MHz / 27.12 MHz | ||
| Frequency Stability | ±0.005% | ||
| Rated Output Power | 600 W | 1 kW | 1.5 kW |
| Power Adjustment Range | 10 W – 600 W | 15 W – 1 kW | 20 W – 1.5 kW |
| Max. Reflected Power | 120 W | 200 W | 300 W |
| RF Output Connector | N-type female or custom | ||
| I/O Port | DB25 female connector | ||
| Communication Interface | RS485 serial, RJ45 Ethernet, standard DB9 female (for matching network) | ||
| Power Stability | 1% of set power, or 0.1% of max. power (whichever is greater) | ||
| Output Mode | Continuous, Pulsed (optional) | ||
| Pulse Frequency | 100 Hz – 30 kHz | ||
| Duty Cycle | 1–99% (min. on/off time: 12 µs) | ||
| Harmonics | < –50 dBc | ||
| Spurious Emissions | < –50 dBc | ||
| Overall Efficiency | ≥ 70% (Z = 50 Ω, rated output) | ||
| Phase Sync Function | Supported | ||
| Protection Functions | Overvoltage, overcurrent, overtemperature; reflected power limit; external interlock; arc suppression | ||
| Cooling Method | Forced air (fan cooling) | ||
| Dimensions (D×W×H mm) | 450 × 483 × 88 | ||
Download detailed technical documentation and product specifications. Access to documentation is available after submitting your email address.
Download product specification
Enter your email to receive the technical datasheet.
By submitting this form, you agree to our Privacy Policy.
Compatible Systems and Components
Industries Using This Technology
EDF systems support research, development and industrial processes in advanced materials and thin film technologies.
Semiconductor research
Thin film deposition and sputtering processes used in semiconductor laboratories.
Materials science
Controlled deposition processes for advanced materials research.
Vacuum coating industry
Stable RF power supply for industrial vacuum coating systems.
Optical coatings
Precise process control for optical thin film applications.
University laboratories
Reliable systems for academic research and experimental setups.
R&D and process development
Flexible power control for testing and developing new coating processes.
Research labs • Universities • Industrial coating facilities
Technical Consultation
Not sure which configuration fits your system? Our engineers will help you select the right solution for your application.
Compatible Systems and Components
Industries Using This Technology
EDF systems support research, development and industrial processes in advanced materials and thin film technologies.
Semiconductor research
Thin film deposition and sputtering processes used in semiconductor laboratories.
Materials science
Controlled deposition processes for advanced materials research.
Vacuum coating industry
Stable RF power supply for industrial vacuum coating systems.
Optical coatings
Precise process control for optical thin film applications.
University laboratories
Reliable systems for academic research and experimental setups.
R&D and process development
Flexible power control for testing and developing new coating processes.
Research labs • Universities • Industrial coating facilities
Technical Consultation
Not sure which configuration fits your system? Our engineers will help you select the right solution for your application.
What you need
Tell us about your application. We will help you select the right solution.
What you need
Tell us about your application. We will help you select the right solution.