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PPS3000D PLASMA POWER SUPPLY

PPS3000D PLASMA POWER SUPPLY

https://www.edfelectronics.com/web/image/product.template/15705/image_1920?unique=18ddfbd
opis sklepu marek

1,200.00 zł 1200.0 PLN 1,200.00 zł

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Terms and Conditions
Lead time 4-6 weeks

Key Technical Parameters

AC220V±10%
Input Supply Voltage
3000W max
Output power
Class B
Insulation level
≤1%
Adjustment accuracy

Universal high-voltage power supply for plasma applications. Widely used to drive magnetron sources where the required power does not exceed 3000W.

The latest in electronics standards place the PPS3000D at the highest level, with exceptional stability and with user friendly features such as "Easy control" which allows device control via mobile devices and through the internet.

Input Supply Voltage( Configurable with order ) AC220V±10%
Output power 3000W max
Output Voltage / Current 200– 1000 VDC negative polarisation (10-volt resolution)
0 – 3000 mA (1 mA resolution)
Insulation level Class B
Adjustment accuracy ≤1%
Regulation mode Power, Voltage or Current mode
Output protection Output overvoltage, output overcurrent, output imbalance
Input protection Input overvoltage, input undervoltage, input overcurrent, phase loss
Communication Interface Analog I/O, Digital on repeat
Type of control Local or remotely
Arc Detection Dynamic is suppression function, less likely to generate arc, wide load adaptability range
Dimensions 483 x 395 x 88 mm (W x D x H)- 2U Rack Mounting Standard
Weight 10.8 kg
  • Operating mode: DC
  • Fast response arc detection/suppression
  • Switched control methods (I, V, P) for maximum performance
  • Transparent interface with graphic display and desk light identification parameters
  • Stable power operation from just 2W
  • High acceptance output impedance - ability to work with magnetrons of different sizes
  • User-friendly interface with graphic display, keypad, and rotary encoder

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Industries Using This Technology

EDF systems support research, development and industrial processes in advanced materials and thin film technologies.

Semiconductor research

Thin film deposition and sputtering processes used in semiconductor laboratories.

Materials science

Controlled deposition processes for advanced materials research.

Vacuum coating industry

Stable RF power supply for industrial vacuum coating systems.

Optical coatings

Precise process control for optical thin film applications.

University laboratories

Reliable systems for academic research and experimental setups.

R&D and process development

Flexible power control for testing and developing new coating processes.

Trusted in collaboration with

Research labs • Universities • Industrial coating facilities

Technical Consultation

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