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RF Power Supply RFX-1200

https://www.edfelectronics.com/web/image/product.template/15629/image_1920?unique=6eeac91
opis sklepu marek

1.00 zł 1.0 PLN 1.00 zł

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Terms and Conditions
Lead time 4-6 weeks

Key Technical Parameters

1200 W
Power range
13.56 MHz
Frequency
±0.1%
Stability
Air cooled
Cooling

Applications & System Integration

Designed for integration with laboratory and industrial sputtering systems used in thin film deposition and vacuum coating processes.

Magnetron sputtering systems
Integration with DC, pulsed DC and RF sputtering setups.
Thin film deposition monitoring
Precise power control for stable thin film growth.
Vacuum coating systems
Compatible with laboratory and industrial vacuum chambers.
Laboratory and R&D environments
Ideal for materials science research and process development.

Overview

The PPS300/600RC series 2-in-1 unit integrates RF Power Generator and Matching Box into one case with a compact structure, small size, and easy installation. With a stable and reliable signal source and power amplifier control module, the incident and reflected power can be accurately measured, and the output power can be precisely controlled. It is widely used in applications such as vacuum plasma generators and thin film deposition.

Key Features

RF Power Generator+Matching Box in one case, compact structure, easy ship and install
Supports local control, IO control and remote control with RS485 and RJ45 ports
Full digital process, matching with high precision and in short time
Support continuously adjust output power from the minimum to the maximum rate with advanced power amplifier technology
Large output power margin, capable of long-term stable operation
Support arc and standing wave protection, quick respond to protect equipment safety in case of abnormalities
Precise measurement for output power, reflected power and load impedance
Support overload, overcurrent and overheat protection
Support automatic gain control (AGC), output power accurate control
Technical Specifications

Questions about specifications? See FAQ →

The system can be configured to match different sputtering and laboratory setups. Available options allow flexible integration with vacuum coating systems and research equipment.

  • Different RF output power configurations
  • Control interface options for laboratory systems
  • Integration with sputtering and vacuum coating equipment
  • Compatibility with external monitoring and control systems
  • Custom configurations available for specific research applications

Additional configurations can be provided depending on system requirements.

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Compatible Systems and Components

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Industries Using This Technology

EDF systems support research, development and industrial processes in advanced materials and thin film technologies.

Semiconductor research

Thin film deposition and sputtering processes used in semiconductor laboratories.

Materials science

Controlled deposition processes for advanced materials research.

Vacuum coating industry

Stable RF power supply for industrial vacuum coating systems.

Optical coatings

Precise process control for optical thin film applications.

University laboratories

Reliable systems for academic research and experimental setups.

R&D and process development

Flexible power control for testing and developing new coating processes.

Trusted in collaboration with

Research labs • Universities • Industrial coating facilities

Technical Consultation

Not sure which configuration fits your system? Our engineers will help you select the right solution for your application.

What you need

Tell us about your application. We will help you select the right solution.