INDUSTRIAL & R&D PLASMA SOLUTIONS
Advanced Plasma & Thin Film Solutions
Explore our cutting-edge portfolio engineered for R&D and industrial applications. We provide a comprehensive range of equipment, from robust Plasma Power Supplies and precise Thin Film Measurements, to highly efficient Atmospheric Plasma treatment systems and Vacuum Plasma treatment systems. Complete your setup with our dedicated Accessories. Select a category below to find the exact technology for your process.
Thickness and Rate bench top monitors
As alternative to PC based monitor, EDF offers rack mounted monitor. The QPM60 multi channel thin film monitor is used to measure rate and thickness in thin film deposition processes. The touch screen display allows for intuitive operation and provides time charts for detailed process control.
QPM comes in 3 versions:
| QPM60-2C | QPM60-4C | QPM60-6C | |
| Dimensions [mm] | 520 x 286 x 550 – 2U standard | 520 x 286 x 550 – 2U standard | 520 x 286 x 550 – 2U standard |
| Weight | 1.6 kg | 1.6 kg | 1.6 kg |
| User Interface | 4.3” Colour TFT and rotary encoder | 4.3” Colour TFT and rotary encoder | 4.3” Colour TFT and rotary encoder |
| Communication interface | RS232 and EthernetIP * | RS232 and EthernetIP * | RS232 and EthernetIP * |
| Inputs channels | 2 | 4 | 6 |
| Frequency Resolution | 0.01 Hz ** | 0.01 Hz ** | 0.01 Hz ** |
| Thickness resolution | 0.012 A ( density = 1) | 0.012 A ( density = 1) | 0.012 A ( density = 1) |
* Ethernet for future firmware development
** each channel requires external oscillator model QM20-EO